Method for producing silicon waveguides on non-soi substrate
AssigneeNational Taiwan University
InventorsCHING-FUH LIN, SHIH-CHE HUNG, SHU-JIA SYU
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Abstract
The present invention relates to a method for producing silicon waveguides on non-SOI substrate (non-silicon-on-insulator substrate), and particularly relates to a method for producing silicon waveguides on silicon substrate with a laser. This method includes the following steps: (1) forming a ridge structure with high aspect ratio on a non-SOI substrate; (2) melting and reshaping the ridge structure by laser illumination for forming a structure having broad upper part and narrow lower part; and (3) oxidizing the structure having broad upper part and narrow lower part to form a silicon waveguide.
Claims28
A method for producing silicon waveguides on non-SOI substrate (non-silicon-on-insulator substrate), comprising:
- (1) forming a ridge structure with high aspect ratio on said non-SOI substrate;
- (2) melting and reshaping said ridge structure by laser illumination for forming a structure having broad upper part and narrow lower part;
- and
- (3) oxidizing said narrow lower part of said structure and periphery part of said broad upper part of said structure to form a silicon waveguide.
Dependencies are inferred from the claim text.