Reusable substrates for electronic device fabrication and methods thereof

A reusable substrate with at least a plurality of grooves for electronic device fabrication, said substrate comprising:

• a substrate body made of sapphire and including a top planar surface, the top planar surface being divided into a plurality of planer regions by the plurality of grooves, the plurality of grooves including a plurality of bottom planar surfaces;
• wherein:
• each of the plurality of grooves includes a bottom planar surface and two side surfaces, the bottom planar surface being selected from the plurality of bottom planar surfaces, the two side surfaces being in contact with the top surface and the bottom surface;
• the bottom planar surface is associated with a groove width from one of the two side surfaces to the other of the two side surfaces, the groove width ranging from 0.1 μm to 5 mm;
• and
• the two side surfaces are associated with a groove depth from the top planar surface to the bottom planar surface, the groove depth ranging from 1 nm to 500 μm;
• wherein:
• each of the plurality of regions is surrounded by a first groove, a second groove, a third groove and a fourth groove, all of the first groove, the second groove, the third groove and the fourth groove being selected from the plurality of grooves;
• the first groove and the second groove are parallel to each other and separated by a first groove interval ranging from 0.1 mm to 50 mm;
• the third groove and the fourth groove are parallel to each other and separated by a second groove interval ranging from 0.1 mm to 50 mm;
• and
• the first groove and the third groove are perpendicular to each other;
• wherein:
• the top planar surface is parallel to each of the plurality of bottom surfaces, the top planar surface being associated with a first surface area, the plurality of bottom surfaces together being associated with a second surface area;
• and
• the second surface area is equal to or less than 10% of a sum of the first surface area and the second surface area.

A method for making a reusable substrate with at least a plurality of grooves for electronic device fabrication, the method comprising:

• providing a substrate body made of one or more substrate materials and including a top surface;
• polishing the substrate body to planarize the top surface;
• coating the substrate body by forming a photoresist layer on the planarized top surface;
• patterning the photoresist layer;
• using the patterned photoresist layer to form the plurality of grooves in the substrate body;
• dividing the top planar surface by the plurality of grooves into a plurality of planar regions, the plurality of planar regions including a plurality of planar bottom surfaces parallel to the top planar surface, each of the plurality of grooves being associated with a groove width ranging from 0.1 μM to 5 mm and a groove depth ranging from 1 nm to 500 mm, each of the planar regions being associated with a dimension ranging from 0.1 mm to 50 mm;
• wherein:
• the top planar surface is associated with a first surface area;
• the plurality of bottom surfaces together is associated with a second surface area;
• and
• the second surface area is equal to or less than 10% of a sum of the first surface area and the second surface area.

A method for using a reusable substrate made of at least a first material with at least a plurality of grooves for electronic device fabrication, said method comprising:

• preparing the reusable substrate including a top planar surface, the top planar surface being divided by the plurality of grooves into a plurality of planar regions, the plurality of planar regions including a plurality of planar bottom surfaces parallel to the top planar surface, each of the plurality of grooves being associated with a groove width ranging from 0.1 μm to 5 mm and a groove depth ranging from 1 nm to 500 μm, each of the planar regions being associated with a dimension ranging from 0.1 mm to 50 mm;
• forming at least a first epitaxial layer made of at least a second material on the plurality of planar regions;
• separating at least the first epitaxial layer from each of the plurality of planar regions;
• and
• after at least the first epitaxial layer is separated from each of the plurality of planar regions, forming at least a second epitaxial layer made of at least a third material on the plurality of planar regions;
• wherein:
• the plurality of planar regions together is associated with a first surface area;
• the plurality of bottom surfaces together is associated with a second surface area;
• and
• the second surface area is equal to or less than 10% of a sum of the first surface area and the second surface area.