Method of manufacturing photoelectric device

A method of manufacturing a solar cell, the method comprising:

• providing a semiconductor substrate, the semiconductor substrate having a first conductivity type;
• performing a first deposition process, the first deposition process including forming a first doping material layer having a second conductivity type different from the first conductivity type;
• rapidly diffusing a dopant of the first doping material layer into the substrate to form an emitter layer at a first surface of the substrate;
• performing a second deposition process after rapidly diffusing the dopant, the second deposition process including forming a second doping material layer thereon, wherein:
• the second doping material layer has the second conductivity type, and
• the first doping material layer together with the second doping material layer have a variable concentration gradient such that a concentration of silicon oxide in the first and second doping material layers is greater in proportion to a proximity with the substrate;
• selectively diffusing the dopant of the first and second doping material layers into the emitter layer to form a contact layer at portions of the first surface of the substrate;
• and
• forming a first electrode on the contact layer and a second electrode on a second surface of the substrate opposite to the first surface.