Fabricating method for controlling hole-wall angle of contact hole in lcd device

A fabricating method for controlling a hole-wall angle of a contact hole in an LCD device, comprising the following steps of:

• A) removing moisture from a substrate through baking in advance, applying hexamethyl disilazane (HMDS) through a gas assisted process, applying a photoresist layer through a spin coating process, and then pre-baking the photoresist layer;
• B) exposing the photoresist layer by using a photomask, wherein protons are generated by a photo-acid generator (PAG) in the photoresist layer when being exposed to light irradiation so that exposed portions of the photoresist are solved by a developer to define a contact hole pattern;
• and
• C) using a developer to develop the photoresist layer to obtain a hole-wall having a preset angle of the contact hole by controlling a development duration, a development temperature and a concentration of the developer.