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US 2013/0095429 A1Published application
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
AssigneeFUJIFILM Corporation
InventorsYusuke Iizuka, Akinori Shibuya, Hidenori Takahashi, Toshiaki Fukuhara, Kousuke Koshijima
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Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.
Claims12
An actinic-ray- or radiation-sensitive resin composition comprising:
- a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below;
- a resin (A) that is configured to decompose when acted on by an acid to thereby increase its solubility in an alkali developer;
- and
- a compound that is configured to generate an acid when exposed to actinic rays or radiation.
- wherein
- R1 represents a hydrogen atom, an alkyl group or a halogen atom,
- Ar1 represents an aromatic ring,
- R2, when x≧2 each independently, represents a substituent,
- Z represents a connecting group whose minimum number of connecting atoms is 3 or more,
- x is an integer of 0 or greater, and
- y is an integer of 1 or greater.
8 more elements
Dependencies are inferred from the claim text.