Radiation-sensitive resin composition

Abstract

A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R1 represents a monovalent cyclic organic group having a cyclic ester structure or a cyclic ketone structure; R2 represents a single bond or —CH2—; X is —O—*, —COO—*, —O—CO—O—* or —SO2-O—*, wherein * denotes a binding site to R3; R3 represents a bivalent chain hydrocarbon group having 1 to 5 carbon atoms; and M+ is a monovalent cation. The base polymer has a structural unit derived from (meth)acrylate that includes a lactone skeleton, a structural unit derived from (meth)acrylate that includes a cyclic carbonate skeleton, a structural unit derived from (meth)acrylate that includes a sultone skeleton, a structural unit derived from (meth)acrylate that includes a polar group, or a combination thereof. R1—R2—X—R3—CHF—CF2—SO3−M+  (1)

Dependencies are inferred from the claim text.