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US 2013/0095426 A1Published application
Photosensitive polymides
AssigneeEternal Chemical Co., Ltd.
InventorsMeng-Yen CHOU, Chuan-Zong LEE
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Abstract
The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.
Claims15
A photosensitive polyimide having a structure represented by formula (I):
- wherein
- B and D are the same or different, and each independently is a divalent organic group;
- A is a tetravalent organic group containing at least one modifying group R′, J is a tetravalent organic group without a modifying group R′, n is an integer of greater than 0, and m is an integer of greater than 0,
- R′ is a group selected from:
- wherein R is a group selected from:
- wherein
- R1 is a substituted or unsubstituted C1-C20 saturated or unsaturated organic group;
- and
- R2 is a vinyl-containing unsaturated group.
6 more elements
A photosensitive polyimide having a structure represented by formula (I):
- wherein
- B and D are the same or different, and each independently is a divalent organic group;
- A is selected from the group consisting of:
- wherein
- R′ is a group selected from:
- wherein R is a vinyl-containing unsaturated group or a group selected from:
- wherein
- R1 is a substituted or unsubstituted C1-C20 saturated or unsaturated organic group;
- and
- R2 is a vinyl-containing unsaturated group;
- R13 is —CH2—, —O—, —S—, —CO—, —SO2—, —C(CH3)2— or —C(CF3)2—;
- R14 is —H or —CH3—;
- X is —O—, —NH— or —S—;
- J is a tetravalent organic group without a modifying group R′, n is an integer of greater than 0, and m is an integer of greater than 0,
11 more elements
Dependencies are inferred from the claim text.