Photoresist composition

Abstract

A photoresist composition which comprises a resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom, R2 represents a C1-C6 alkyl group, R3 represents a hydrogen atom or a C1-C6 alkyl group, and an acid generator represented by formula (B1) wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lb1 represents a single bond or a C1-C24 divalent aliphatic hydrocarbon group where a methylene group can be replaced by —O— or —CO—, Y represents a hydrogen atom, or a C3-C18 alicyclic hydrocarbon group in which a methylene group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic cation.

Dependencies are inferred from the claim text.