Compound, resin and photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorsKoji ICHIKAWA, Hiromu SAKAMOTO, Shingo FUJITA
Life of this patent
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Abstract
A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
Claims7
A resin comprising a structural unit represented by formula (aa):
- wherein T1 represents a C3-C34 sultone ring group optionally having a substituent,
- X1 represents —O— or —N(Rc)—,
- Rc represents a hydrogen atom or a C1-C6 alkyl group,
- Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—,
- and Rd represents a hydrogen atom or a C1-C6 alkyl group, and
- R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
A compound represented by formula (aa′).
- wherein T1 represents a C3-C34 sultone ring group optionally having a substituent,
- X1 represents —O— or —N(Rc)—,
- Rc represents a hydrogen atom or a C1-C6 alkyl group,
- Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—,
- and Rd represents a hydrogen atom or a C1-C6 alkyl group, and
- R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
Dependencies are inferred from the claim text.