Transparent conductive film having excellent visibility and method of manufacturing the same
AssigneeLG Hausys, Ltd.
InventorsIn-Sook Kim, Jung Cho
Life of this patent
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Abstract
A transparent conductive film having excellent visibility and a method of manufacturing the same are disclosed. The transparent conductive film having excellent visibility includes a transparent film; an undercoating layer formed on the transparent film; and a conductive layer formed on the undercoating layer, wherein the undercoating layer includes a first low refractive index layer formed of a material having an index of refraction of 1.4 to 1.46 at a lower side of the conductive layer, and a high refractive index layer formed of silicon oxynitride having an index of refraction of 1.7 to 2.0 between the first low refractive index layer and the transparent film.
Claims17
A transparent conductive film, comprising:
- a transparent film;
- an undercoating layer formed on the transparent film;
- and
- a conductive layer formed on the undercoating layer,
- wherein the undercoating layer comprises a first low refractive index layer formed of a material having an index of refraction of 1.4 to 1.46 at a lower side of the conductive layer, and a high refractive index layer formed of silicon oxynitride having an index of refraction of 1.7 to 2.0 between the first low refractive index layer and the transparent film.
A method of manufacturing a transparent conductive film, comprising:
- forming a high refractive index layer of silicon oxynitride having an index of refraction of 1.7 to 2.0 on a transparent film;
- forming a first low refractive index layer of a material having an index of refraction of 1.4 to 1.46 on the high refractive index layer;
- and
- forming a conductive layer on the first low refractive index layer,
- wherein the high refractive index layer and the first low refractive index layer are formed by sputtering or ion plating.
Dependencies are inferred from the claim text.