Multiple patterning technology method and system for achieving minimal pattern mismatch
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsFeng-Ming Chang, Chang-Ta Yang, Ping-Wei Wang, Min Cao
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Abstract
The present disclosure provides for many different embodiments of a multiple patterning technology method and system. An exemplary method includes receiving a pattern layout having a plurality of features; coloring each of the plurality of features one of at least two colors, thereby forming a colored pattern layout, wherein the coloring includes coloring match-sensitive features a same color; and fabricating at least two masks with the features of the colored pattern layout, wherein each mask includes features of a single color.
Claims20
A method comprising:
- receiving a pattern layout having a plurality of features;
- coloring each of the plurality of features one of at least two colors, thereby forming a colored pattern layout, wherein the coloring includes coloring match-sensitive features a same color;
- and
- fabricating at least two masks with the features of the colored pattern layout, wherein each mask includes features of a single color.
A method comprising:
- receiving a pattern layout of an integrated circuit device having a plurality of features, wherein match-sensitive feature sets of the plurality of features are identified;
- coloring each of the plurality of features one of at least two colors, thereby forming a colored pattern layout, wherein the coloring includes coloring each of the match-sensitive features a same color;
- and
- fabricating at least two masks with the features of the colored pattern layout, wherein each mask includes features of a single color.
An apparatus comprising:
- a computer readable medium that stores a plurality of instructions for execution by at least one computer processor, wherein the instructions are for:
- receiving a pattern layout having a plurality of features;
- coloring each of the plurality of features one of at least two colors, thereby forming a colored pattern layout, wherein the coloring includes coloring match-sensitive features a same color;
- and
- fabricating at least two masks with the features of the colored pattern layout, wherein each mask includes features of a single color.
Dependencies are inferred from the claim text.