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US 2013/0094006 A1Published application
Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
AssigneesZao Nikon Co., Ltd., Nikon Corporation
InventorsAtsushi OHTA, Takashi HORIUCHI
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Abstract
A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.
Claims6
An exposure apparatus which exposes a substrate via a projection optical system and an immersion liquid, comprising:
- a substrate table which moves under the projection optical system while holding the substrate;
- an immersion system which has a liquid supply port and a liquid recovery port, the immersion liquid being supplied onto a part of the substrate via the liquid supply port and being recovered via the liquid recovery port to form a liquid immersion region onto the part of the substrate;
- and
- a liquid detecting device which detects a remaining immersion liquid onto the substrate after the substrate has been exposed via the immersion region, the remaining immersion liquid being a liquid which is not recovered via the liquid recovery port.
1 more element
Dependencies are inferred from the claim text.