Imprint apparatus and article manufacturing method using same

A device manufacturing method for manufacturing a device, the method comprising:

• transferring a pattern formed on a mold to a resin on a substrate using an imprint apparatus;
• and
• etching the substrate on which the transferred pattern has been formed,
• wherein the imprint apparatus comprises:
• a shape correction mechanism configured to apply a force to the mold to thereby deform a pattern region formed on the mold;
• a heating mechanism configured to heat a substrate-side pattern region formed on the substrate to thereby deform the substrate-side pattern region;
• and
• a control unit configured to obtain information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and control the shape correction mechanism and the heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information.

An imprint method for transferring a pattern formed on a mold to a resin on a substrate, the method comprising:

• applying a force to the mold to thereby deform a pattern region formed on the mold;
• heating a substrate-side pattern region formed on the substrate to thereby deform the substrate-side pattern region;
• and
• curing the resin on the substrate in a state where the pattern region formed on the mold and the substrate-side pattern region are deformed.