Solid-state imaging device and manufacturing method of solid-state imaging device

A manufacturing method of a solid-state imaging device comprising:

• forming a photoelectric conversion layer;
• and
• forming a color filter above the photoelectric conversion layer;
• wherein
• the forming of the color filter includes,
• forming a multi-layer interference filter in which a first layer and a second layer having different index of refraction from each other are alternately stacked, and
• forming a guided mode resonant grating at a position to be above or below the multi-layer interference filter;
• the forming of the guided mode resonant grating includes,
• forming a plurality of diffraction gratings with a material having a first index of refraction so as to be periodically arrayed at least one-dimensionally,
• embedding an insulating film having a second index of refraction lower than the first index of refraction between the plurality of diffraction gratings so that an air gap region is formed between the plurality of diffraction gratings, and thereby forming a plurality of inter-grating regions including the air gap region and an insulating film region between at least the plurality of diffraction gratings, and
• planarizing an upper surface of the embedded insulating film.