Process for making a patterned metal oxide structure

A process for making a patterned metal oxide structure comprising the steps of:

• (a) polymerizing a resist mixture, while in contact with a mold having imprint forming patterns thereon, to thereby form an imprint structure comprising the polymerized organometallic compound, said resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having at least one carboxylate of Formula 1:
• wherein
• n is 1-12;
• and
• each is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl;
• or at least one acetoacetate of Formula 2:
• wherein
• m is 0-12;
• n is 0-12;
• A is —(C═O)— or a bond;
• B is —(CR2)mO—, —(CR2CR2O)m—, or a bond;
• and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl;
• and
• (b) heating said imprint structure to remove organic material and thereby form said patterned metal oxide structure.

A process for forming a plurality of patterned metal oxide structures comprising the steps of:

• (a) polymerizing a resist mixture, while in contact with a mold having imprint forming patterns thereon, to thereby form an imprint structure comprising the polymerized organometallic compound on a first area of a substrate, said resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having at least one carboxylate of Formula 1:
• wherein
• n is 1-12;
• and
• each R is independently selected from the group consisting of hydrogen, alkyl alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl;
• or at least one acetoacetate of Formula 2:
• wherein
• n is 0-12;
• n is 0-12;
• A is —(C═O)— or a bond;
• B is —(CR2)mO—, —(CR2CR2O)m—, or a bond;
• and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl;
• b) heating said imprint structure on said first area to remove organic material and thereby form said patterned metal oxide structure on said first area;
• and
• (c) repeating steps (a) and (b) on a second area of said substrate in order to form said plurality of patterned metal oxide structures throughout the substrate.