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US 2013/0077086 A1Published application
Solid-State Laser And Inspection System Using 193nm Laser
AssigneeKLA-Tencor Corporation
InventorsYung-Ho Chuang, Vladimir Dribinski, J. Joseph Armstrong
Life of this patent
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Abstract
An improved solid-state laser for generating 193 nm light is described. This laser uses the 6th harmonic of a fundamental wavelength near 1160 nm to generate the 193 nm light. The laser mixes the 1160 nm fundamental wavelength with the 5th harmonic, which is at a wavelength of approximately 232 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
Claims24
A laser for generating approximately 193 nm wavelength light, the laser comprising:
- a seed laser generating a fundamental frequency of approximately 1160 nm;
- a first stage for combining portions of the fundamental frequency to generate a second harmonic frequency;
- a second stage for combining portions of the second harmonic frequency to generate a fourth harmonic frequency;
- a third stage for combining the fundamental frequency and the fourth harmonic frequency to generate a fifth harmonic frequency;
- and
- a fourth stage for combining the fundamental frequency and the fifth harmonic frequency to generate a sixth harmonic frequency of approximately 193.3 nm.
3 more elements
A method of generating approximately 193 nm wavelength light, the method comprising:
- generating a fundamental frequency of approximately 1160 nm;
- combining portions of the fundamental frequency to generate a second harmonic frequency;
- combining portions of the second harmonic frequency to generate a fourth harmonic frequency;
- combining the fundamental frequency and the fourth harmonic frequency to generate a fifth harmonic frequency;
- combining the fundamental frequency and the fifth harmonic frequency to generate a sixth harmonic frequency of approximately 193.3 nm.
2 more elements
An optical inspection system for inspecting a surface of a photomask, reticle, or semiconductor wafer for defects, the system comprising:
- a light source for emitting an incident light beam along an optical axis, the light source including a 6th harmonic generator for generating 193 nm wavelength light;
- an optical system disposed along the optical axis and including a plurality of optical components for directing the incident light beam to a surface of the photomask, reticle or semiconductor wafer, the optical system being configured to scan the surface;
- a transmitted light detector arrangement including transmitted light detectors, the transmitted light detectors being arranged for sensing a light intensity of transmitted light;
- and
- a reflected light detector arrangement including reflected light detectors, the reflected light detectors being arranged for sensing a light intensity of reflected light.
2 more elements
An inspection system for inspecting a surface of a sample, the inspection system comprising:
- an illumination subsystem configured to produce a plurality of channels of light, each channel of light produced having differing characteristics from at least one other channel of light energy, the illumination subsystem including a 6th harmonic generator for generating 193 nm wavelength light for at least one channel;
- optics configured to receive the plurality of channels of light and combine the plurality of channels of light energy into a spatially separated combined light beam and direct the spatially separated combined light beam toward the sample;
- and
- a data acquisition subsystem comprising at least one detector configured to detect reflected light from the sample,
- wherein the data acquisition subsystem is configured to separate the reflected light into a plurality of received channels corresponding to the plurality of channels of light.
2 more elements
A catadioptric inspection system comprising:
- an ultraviolet (UV) light source for generating UV light, the UV light source including a 6th harmonic generator for generating 193 nm wavelength light;
- a plurality of imaging sub-sections, each sub-section including:
- a focusing lens group including a plurality of lens elements disposed along an optical path of the system to focus the UV light at an intermediate image within the system and simultaneously to provide correction of monochromatic aberrations and chromatic variation of aberrations over a wavelength band including at least one wavelength in an ultraviolet range, the focusing lens group further including a beam splitter positioned to receive the UV light;
- a field lens group with a net positive power aligned along the optical path proximate to the intermediate image, the field lens group including a plurality of lens elements with different dispersions, with lens surfaces disposed at second predetermined positions and having curvatures selected to provide substantial correction of chromatic aberrations including at least secondary longitudinal color as well as primary and secondary lateral color of the system over the wavelength band;
- a catadioptric lens group including at least two reflective surfaces and at least one refractive surface disposed to form a real image of the intermediate image, such that, in combination with the focusing lens group, primary longitudinal color of the system is substantially corrected over the wavelength band;
- and
- a zooming tube lens group, which can zoom or change magnification without changing its higher-order chromatic aberrations, including lens surfaces disposed along one optical path of the system;
- and
- a folding mirror group configured to allow linear zoom motion, thereby providing both fine zoom and wide range zoom.
6 more elements
A catadioptric imaging system with dark-field illumination, the system comprising:
- an ultraviolet (UV) light source for generating UV light, the UV light source including a 6th harmonic generator for generating 193 nm wavelength light;
- adaptation optics;
- an objective including a catadioptric objective, a focusing lens group, and a zooming tube lens section;
- and
- a prism for directing the UV light along the optical axis at normal incidence to a surface of a sample and directing specular reflections from surface features of the sample as well as reflections from optical surfaces of the objective along an optical path to an imaging plane.
2 more elements
An optical system for detecting anomalies of a sample, the optical system comprising:
- a laser system for generating first and second beams, the laser system comprising:
- a light source including a 6th harmonic generator for generating 193 nm wavelength light;
- an annealed, frequency-conversion crystal;
- a housing to maintain an annealed condition of the crystal during standard operation at a low temperature;
- first beam shaping optics configured to receive a beam from the light source and focus the beam to an elliptical cross section at a beam waist in or proximate to the crystal;
- and
- a harmonic separation block to receive an output from the crystal and generate therefrom the first and second beams and at least one undesired frequency beam;
- first optics directing the first beam of radiation along a first path onto a first spot on a surface of the sample;
- second optics directing the second beam of radiation along a second path onto a second spot on a surface of the sample, said first and second paths being at different angles of incidence to said surface of the sample;
- a first detector;
- collection optics including a curved mirrored surface receiving scattered radiation from the first or the second spot on the sample surface and originating from the first or second beam and focusing the scattered radiation to the first detector, the first detector providing a single output value in response to the radiation focused onto it by said curved mirrored surface;
- and
- an instrument causing relative motion between the first and second beams and the sample so that the spots are scanned across the surface of the sample.
10 more elements
A surface inspection apparatus, comprising:
- a laser system for generating a beam of radiation at 193 nm, the laser system comprising a solid-state laser including a 6th harmonic generator for generating the beam of radiation;
- an illumination system configured to focus the beam of radiation at a non-normal incidence angle relative to a surface to form an illumination line on the surface substantially in a plane of incidence of the focused beam, wherein the plane of incidence is defined by the focused beam and a direction that is through the focused beam and normal to the surface;
- a collection system configured to image the illumination line, wherein the collection system comprises:
- an imaging lens for collecting light scattered from a region of the surface comprising the illumination line;
- a focusing lens for focusing the collected light;
- and
- a device comprising an array of light sensitive elements, wherein each light sensitive element of the array of light sensitive elements is configured to detect a corresponding portion of a magnified image of the illumination line.
4 more elements
A pulse multiplier comprising:
- a laser system for generating an input laser pulse, the laser system comprising:
- a light source at approximately 1160 nm;
- a solid-state laser for receiving light from the light source and with a 6th harmonic generator generating therefrom the input laser pulse at approximately 193 nm;
- a polarizing beam splitter that receives the input laser pulse;
- a wave plate for receiving light from the polarized beam splitter and generating a first set of pulses and a second set of pulses, the first set of pulses having a different polarization than the second set of pulses;
- and
- a set of mirrors for creating a ring cavity including the polarizing beam splitter and the wave plate,
- wherein the polarizing beam splitter transmits the first set of pulses as an output of the pulse multiplier and reflects the second set of pulses into the ring cavity.
5 more elements
A laser for generating approximately 193 nm wavelength light, the laser comprising:
- a seed laser generating a fundamental frequency of approximately 1160 nm;
- a first stage for combining portions of the fundamental frequency to generate a second harmonic frequency;
- a second stage for combining portions of the fundamental frequency and the second harmonic frequency to generate a third harmonic frequency;
- a third stage for combining portions of the second harmonic frequency and the third harmonic frequency to generate a fifth harmonic frequency;
- and
- a fourth stage for combining portions of the fundamental frequency and the fifth harmonic frequency to generate a sixth harmonic frequency of approximately 193.3nm.
3 more elements
Dependencies are inferred from the claim text.