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US 2013/0077080 A1Published application
Holding apparatus, exposure apparatus, exposure metod, and device manufacturing method
AssigneeNikon Corporation
InventorHajime Yamamoto
Life of this patent
Estimating the term…
Abstract
A holding apparatus is provided with a holding member that has a holding surface that holds a substrate on which a pattern is to be formed, a plurality of first electrode members that are provided on the holding member and that generate electrostatic force in accordance with supplied voltage in order to attract the substrate to the holding surface, and a power supply device that is able to supply voltage to the first electrode members. The first electrode members are positioned in accordance with pattern information.
Claims29
1-19. (canceled)
A holding apparatus comprising:
- a holding member that has a holding surface, the holding surface holding a substrate on which a pattern is to be formed;
- a plurality of first electrode members that are provided on the holding member and that are arranged in accordance with pattern information relating to the pattern, and that generate electrostatic force in accordance with supply of a voltage in order to attract the substrate to the holding surface;
- and
- a moving mechanism that, after a pattern has been formed on the substrate, moves the holding member and the substrate relative to each other such that the holding surface and the substrate are separated from each other.
1 more element
A holding apparatus comprising:
- a holding member that has a holding surface that holds a substrate;
- at least one first electrode member that is provided on the holding member, and that generates electrostatic field in accordance with supply of a voltage in order to attract the substrate to the holding surface;
- and
- a moving mechanism that has a supporting surface that supports the substrate and that comprises a moving member that moves the substrate relative to the holding member while supporting a predetermined area of the substrate such that the holding surface and the substrate are separated from each other, and
- a second electrode member that is provided on the moving member, and that generates electrostatic field in accordance with supply of a voltage in order to attract the substrate to the supporting surface.
2 more elements
A holding apparatus comprising:
- a holding member that has a holding surface that holds a substrate;
- an electrode member that is provided on the holding member and generate electrostatic force in order to attract the substrate to the holding surface;
- a moving mechanism that moves the substrate and the holding member relatively to each other such that the holding surface and the substrate are separated from each other;
- and
- an antistatic device that removes electrostatic charge on the substrate when the holding member and the substrate are being separated from each other.
2 more elements
39-49. (canceled)
An exposure method for exposing a substrate with exposure light from a pattern, the method comprising:
- mounting the substrate on a holding surface of a holding member on which a plurality of first electrode members are provided;
- supplying voltage to the first electrode members in order to attract the substrate to the holding surface by electrostatic force
- sequentially irradiating shot areas on the substrate with exposure light from the pattern, separating the substrate on which the pattern has been formed from the holding surface, wherein the value of a first voltage that is supplied to the first electrode members, which correspond to shot areas where the irradiation of the exposure light has not yet been formed and where the irradiation of the exposure light is currently underway, is higher than the value of a second voltage that is supplied to the first electrode members, which are different from the first electrode members to which the first voltage is supplied;
- and
- separating the substrate on which the pattern has been formed from the holding surface, wherein a relative movement between the holding member and the substrate is started such that one portion of the substrate becomes separated first from the holding surface before other portions of the substrate.
2 more elements
An exposure method for exposing a substrate with exposure light, the method comprising:
- mounting the substrate on a holding surface of a holding member on which a first electrode member is provided;
- supplying voltage to the first electrode member in order to attract the substrate to the holding surface by electrostatic force;
- exposing the substrate by irradiating exposure light onto the substrate while the substrate is being held on the holding surface;
- and
- separating the exposed substrate and the holding surface, wherein
- voltage is supplied to a second electrode member that is provided on a moving member which has a supporting surface which is capable of supporting the substrate in order to attract the substrate to the supporting surface by means of electrostatic force, and, when the supporting surface and the substrate are attracted together by electrostatic force, the substrate and the holding surface are separated by moving the moving member.
3 more elements
An exposure method for exposing a substrate with exposure light, the method comprising:
- mounting the substrate on a holding surface of a holding member on which a first electrode member is provided;
- supplying voltage to the first electrode member in order to attract the substrate to the holding surface by means of electrostatic force;
- exposing the substrate by irradiating exposure light onto the substrate while the substrate is being held on the holding surface;
- and
- separating the exposed substrate and the holding surface, wherein
- electrostatic charge on the substrate is removed when the holding member and the substrate are being separated from each other.
3 more elements
(canceled)
Dependencies are inferred from the claim text.