Radiation Source

A fluid stream generator, comprising:

• a reservoir configured to retain a volume of a fluid;
• a nozzle, in fluid connection with the reservoir, and configured to direct a stream of the fluid along a trajectory;
• and
• a contamination filter assembly located in a fluid flow path of the fluid stream generator, upstream of a nozzle outlet, comprising a filter medium, wherein the filter medium is configured to be held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.

A method, comprising:

• removing a filter medium from a contamination filter assembly of a fluid stream generator filter, the filter medium being clamped in position within the filter assembly by one or more objects that at least partially surround the filter medium;
• removing a clamping force provided by the one or more objects that at least partially surround the filter medium;
• and
• removing the unclamped filter medium.

A radiation source, comprising:

• a reservoir configured to retain a volume of a fuel;
• a nozzle, in fluid connection with the reservoir, configured to direct a stream of the fuel along a trajectory towards a plasma formation location;
• a laser radiation assembly configured to direct laser radiation at the stream at the plasma formation location to generate a radiation generating plasma;
• and
• a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of the contamination filter assembly comprising a ceramic material.

A fluid stream generator, comprising:

• a reservoir configured to retain a volume of a fluid;
• a nozzle, in fluid connection with the reservoir, and configured to direct a stream of the fluid along a trajectory;
• and
• a contamination filter assembly located in a fluid flow path of the fluid stream generator, upstream of a nozzle outlet, including a filter medium, wherein the filter medium comprises a ceramic material.

A lithographic apparatus comprising:

• an illumination system for providing a radiation beam;
• a patterning device for imparting the radiation beam with a pattern in its cross-section;
• a substrate holder for holding a substrate;
• a projection system for projecting the patterned radiation beam onto a target portion of the substrate, and
• wherein the lithographic apparatus further comprises:
• a reservoir configured to retain a volume of a fuel;
• a nozzle, in fluid connection with the reservoir, configured to direct a stream of the fuel along a trajectory towards a plasma formation location;
• a laser radiation assembly configured to direct laser radiation at the stream at the plasma formation location to generate a radiation generating plasma;
• and
• a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of the contamination filter assembly configured to be held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.