Cleaning substrate for a lithography apparatus, a cleaning method for a lithography apparatus and a lithography apparatus
OwnerRaymond Wilhelmus Louis LAFARRE, Roelof Frederik De Graaf +5inventors
InventorsRaymond Wilhelmus Louis LAFARRE, Roelof Frederik De Graaf, Niek Jacobus Johannes Roset, Arjan Hubrecht Josef Anna Martens, Alexander Nikolov Zdravkov, Kornelis Tijmen Hoekerd, Nina Vladimirovna Dziomkina
Life of this patent
Estimating the term…
Abstract
A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.
Claims20
A cleaning method for a lithography apparatus, wherein the lithography apparatus comprises:
- a table having an upper surface and a recess in the upper surface that is configured to receive and support an object;
- a fluid handling structure configured to supply and confine immersion fluid to a space adjacent to the upper surface of the table and/or an object located in the recess;
- and
- a cover comprising a planar body that, in use, extends around the object from the upper surface at an edge of the recess to a peripheral section of an upper major face of the object in order to cover a gap between an edge of the recess and the edge of the object, wherein the method comprises:
- cleaning a surface of the cover.
A cleaning method for a lithography apparatus, wherein the lithography apparatus comprises:
- a table having an upper surface and a recess in the upper surface that is configured to receive and support an object;
- a fluid handling structure configured to supply and confine immersion fluid to a space adjacent to the upper surface of the table and/or an object located in the recess;
- and
- a cover comprising a planar body that, in use, extends around the object from the upper surface at an edge of the recess to a peripheral section of an upper major face of the object in order to cover a gap between an edge of the recess and the edge of the object, wherein the method comprises:
- providing relative movement between the cover and a cleaning substrate located in the recess so as to bring the cover and the cleaning substrate into contact with each other and to remove the cover from contact with the cleaning substrate, so as to clean the cover.
A cleaning substrate for a lithography apparatus, comprising:
- a base layer having a width of 300 mm or 450 mm, to within a tolerance of 2%, and a maximum thickness of less than 2 mm;
- and
- an adhesive, abrasive or porous film formed on at least one of the major faces of the base layer, the film present within 0.5 mm of the peripheral edge of the base layer.
A cleaning method for a lithography apparatus, wherein the lithography apparatus comprises:
- a table having an upper surface and a recess in the upper surface that is configured to receive and support an object;
- a fluid handling structure configured to confine immersion fluid to a space adjacent to the upper surface of the table and/or an object located in the recess;
- and
- a cover comprising a planar body that, in use, extends around the object from the upper surface to a peripheral section of an upper major face of the object in order to cover a gap between an edge of the recess and an edge of the object, wherein the method comprises:
- directing radiation onto the cover in order to clean the cover.
A lithography apparatus comprising:
- a table having an upper surface and a recess in the upper surface that is configured to receive and support an object;
- a fluid handling structure configured to confine immersion fluid in a space adjacent to the upper surface of the table and/or an object located in the recess;
- a cover comprising a planar body that, in use, extends around the object from the upper surface to a peripheral section of an upper major face of the object in order to cover a gap between an edge of the recess and an edge of the object;
- and
- a cover cleaning system to clean a surface of the cover.
Dependencies are inferred from the claim text.