Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

An arrangement for use in a projection exposure tool for microlithography, the arrangement comprising:

• a reflective optical element including a carrier for imparting mechanical strength to said optical element;
• said reflective optical element further including a reflective coating disposed on said carrier for reflecting use radiation having a first wavelength;
• a greater part by volume of said carrier comprising a material which, upon interaction with said use radiation, emits a secondary radiation having a second wavelength different from said first wavelength;
• and,
• a radiation detector configured to detect said secondary radiation.

An arrangement for use in a projection exposure tool for microlithography, the arrangement comprising:

• a reflective optical element including a carrier for imparting mechanical strength to said optical element;
• said reflective optical element further including a reflective coating disposed on said carrier for reflecting use radiation;
• said carrier comprising a material which, upon interaction with an activation radiation, converts said activation radiation into a secondary radiation different from said activation radiation;
• said material being configured to cause an efficiency of the radiation conversion to be temperature dependent;
• and,
• a radiation detector configured to detect said secondary radiation.

An optics module for use in a projection exposure tool for microlithography, the optics module comprising:

• an arrangement including a reflective optical element including a carrier for imparting mechanical strength to said element;
• said carrier comprising a low expansion material having a coefficient of thermal expansion lying in the range of −200 ppb/° C. to 200 ppb/° C. over a temperature range of 5° C. to 35° C.;
• a radiation detector configured to detect radiation generated by the low expansion material;
• and,
• said optics module being configured as illumination optics for illuminating an object field of the projection exposure tool or being configured as projection optics for imaging structures from the object field into an image field.

A projection exposure tool for microlithography comprising:

• an arrangement including a reflective optical element including a carrier for imparting mechanical strength to said element;
• said carrier comprising a low expansion material having a coefficient of thermal expansion lying in the range of −200 ppb/° C. to 200 ppb/° C. over a temperature range of 5° C. to 35° C.;
• and,
• a radiation detector configured to detect radiation generated by the low expansion material.

A method of measuring a temperature on an optical element of a projection exposure tool for microlithography, which optical element comprises a material configured for converting impinging activation radiation into a secondary radiation differing from the activation radiation, the method comprising the steps of:

• irradiating activation radiation onto the optical element, which activation radiation comprises exposure radiation of the projection exposure tool;
• measuring the intensity of secondary radiation passing out of the optical element;
• and,
• determining a temperature at the optical element from the measured intensity.