Surface depressions for die-to-die interconnects and associated systems and methods
AssigneeMicron Technology, Inc.
InventorDavid S. Pratt
Life of this patent
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AssigneeMicron Technology, Inc.
InventorDavid S. Pratt
Estimating the term…
Stacked microelectronic dies employing die-to-die interconnects and associated systems and methods are disclosed herein. In one embodiment, a stacked system of microelectronic dies includes a first microelectronic die, a second microelectronic die attached to the first die, and a die-to-die interconnect electrically coupling the first die with the second die. The first die includes a back-side surface, a surface depression in the back-side surface, and a first metal contact located within the surface depression. The second die includes a front-side surface and a second metal contact located at the front-side surface and aligned with the first metal contact of the first die. The die-to-die interconnect electrically couples the first metal contact of the first die with the second metal contact of the second die and includes a flowable metal layer that at least partially fills the surface depression of the first die.
An interconnect structure for electrically coupling a first microelectronic die with a second microelectronic die, comprising:
A method of manufacturing a stacked system of microelectronic dies, the method comprising:
A method of manufacturing a microelectronic workpiece, the method comprising:
Dependencies are inferred from the claim text.