A thin-film semiconductor device for a display apparatus, the thin-film semiconductor device comprising:
- a substrate;
- a gate electrode above the substrate;
- a gate insulating film above the substrate to cover the gate electrode;
- a semiconductor layer on the gate insulating film and above the gate electrode;
- a first electrode above the semiconductor layer;
- a second electrode above the semiconductor layer, the second electrode being in a same layer as the first electrode;
- a first power supply line electrically connected to the second electrode and in a same layer as the second electrode;
- an interlayer insulating film above the gate insulating film to cover the first electrode and the second electrode;
- a gate line above the interlayer insulating film to cross the first power supply line, the interlayer insulating film being in a layer different from a layer including the gate electrode;
- and
- a second power supply line in a same layer as the gate line and adjacent to the gate line,
- wherein the gate electrode and the gate line are electrically connected via a first conductive portion passing through the gate insulating film and the interlayer insulating film,
- the first power supply line and the second power supply line are electrically connected via a second conductive portion passing through the interlayer insulating film, and
- capacitance per unit area in the interlayer insulating film interposed between a layer including the gate line and a layer including the first power supply line is smaller than capacitance per unit area in the gate insulating film interposed between the layer including the gate electrode and the layer including the first power supply line.