Substrate plating apparatus with multi-channel field programmable gate array

A system for electroplating a substrate, comprising:

• a controller an FPGA providing multiple output channels;
• a power section connected to each output channel, with each power section having one or more power transistors;
• a feedback loop on each output channel for sensing current flow in each channel and providing a feedback signal to the FPGA;
• a bulk power supply connected to the power section;
• and
• an electroplating chamber having multiple electrodes, with each electrode connected to at least one output channel.

A method of operation of a substrate electroplating system, comprising:

• using a controller having an FPGA to independently control output current to two or more electrodes in an electroplating chamber;
• monitoring the output current supplied to each electrode and adjusting the output current to a desired setpoint in a feedback loop;
• and
• electroplating a substrate via current flow through an electrolyte from the electrodes to the substrate.