Heating systems for thin film formation

A system for forming one or more layers of one or more materials on one or more substrates, the system comprising:

• a susceptor component configured to rotate around a susceptor axis;
• at least one substrate holder located directly or indirectly on the susceptor component and configured to support the one or more substrates, the substrate holder being further configured to cause the one or more substrates to rotate around at least the susceptor axis;
• and
• at least one heating device configured to heat the one or more substrates directly without through the susceptor component and the substrate holder;
• wherein:
• the heating device is further configured to provide a first temperature on the one or more substrates only if the one or more substrates rotate around at least the susceptor axis, the first temperature being constant along a first radial direction from the susceptor axis;
• and
• the heating device includes a first plurality of heating resistors and a second plurality of heating resistors, each of the first plurality of heating resistors being located along a second radial direction from the susceptor axis, each of the second plurality of heating resistors being conductively connected to at least two heating resistors selected from the first plurality of heating resistors.

A system for forming one or more layers of one or more materials on one or more substrates, the system comprising:

• a susceptor component configured to rotate around a susceptor axis;
• at least one substrate holder located directly or indirectly on the susceptor component and configured to support the one or more substrates, the substrate holder being further configured to cause the one or more substrates to rotate around at least the susceptor axis;
• and
• at least one heating device configured to heat the one or more substrates;
• wherein:
• each of the one or more substrates includes a substrate surface facing the heating device and associated with a bow height;
• and
• the heating device is located away from the substrate surface by a distance;
• wherein for each of the one or more substrates, the distance is at least twenty times as large as the bow height.