Method for correcting electronic proximity effects using off-center scattering functions
AssigneesAselta Nanographics, Commissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsPatrick SCHIAVONE, Thiago Figueiro
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Abstract
A method for projecting an electron beam, used notably in direct or indirect writing lithography and in electronic microscopy. Proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. For this, the convolution of a point spread function with the geometry of the target is conventionally used. At least one of the components of the point spread function has its maximum value not located on the center of the beam. Preferably, the maximum value is instead located on the backward scattering peak. Advantageously, the point spread function uses gamma distribution laws.
Claims12
A method for projecting an electronic beam onto a target comprising:
- a step of correcting effects of forward and backward scattering of said beam comprising a substep of calculating a point spread function, wherein said point spread function comprises at least one function a maximum value of which is not located on a center of the beam.
A non-ephemeral computer-readable media comprising program code that is configured to be executable by a computer to provide a module for simulating or correcting effects of forward and backward scattering of an electron beam, said module comprising a submodule for calculating a point spread function, wherein said point spread function comprises at least one function the maximum value of which is not located on a center of the electron beam.
Dependencies are inferred from the claim text.