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US 2013/0014696 A1Published application
Apparatus to conduct spin-on film processing
AssigneeMicron Technology, Inc.
InventorsNishant Sinha, Gurtej S. Sandhu, John Smythe
Life of this patent
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Abstract
An apparatus and process operate to impose acoustic radiation pressure upon a spin-on mass to alter topography of the spin-on mass. Other apparatus and processes are disclosed.
Claims20
An apparatus comprising:
- a spinner on which to place a wafer;
- a source operable to alter topography of a spin-on mass when the spin-on mass is on the wafer, the source being an acoustic radiation pressure broadcast source;
- a mounting substrate to which the source is mounted, the mounting substrate moveable in an oscillatory motion.
An apparatus comprising:
- a spinner on which to place a wafer;
- an array of sources operable to alter topography of a spin-on mass when the spin-on mass is on the wafer, the sources being acoustic radiation pressure broadcast sources;
- a mounting substrate to which the sources are mounted, the mounting substrate moveable in an oscillatory motion.
An apparatus comprising:
- a spinner on which to place a wafer to be processed;
- a first array of sources operable to alter topography of a spin-on mass when the spin-on mass is on the wafer, the sources being acoustic radiation pressure broadcast sources, the first array operably disposed above the wafer to be processed;
- a first mounting substrate to which the first array is mounted, the first mounting substrate moveable in an oscillatory motion;
- a second array of sources operable to alter topography of a spin-on mass when the spin-on mass is on the wafer, the sources being acoustic radiation pressure broadcast sources, the second array operably disposed below the wafer to be processed;
- a second mounting substrate to which the second array is mounted.
2 more elements
Dependencies are inferred from the claim text.