Method of producing polymeric compound, resist composition, and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYoshiyuki Utsumi, Takahiro Dazai, Masatoshi Arai, Takaaki Kaiho
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Abstract
A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.
Claims7
A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method comprising:
- synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation.
Dependencies are inferred from the claim text.