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US 2012/0270168 A1Published application
Lamphead atmosphere
AssigneeApplied Materials, Inc.
InventorJOSEPH M. RANISH
Life of this patent
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Abstract
A method and apparatus for thermal processing of semiconductor substrates is disclosed. Each lamp of a lamp assembly is immersed in a thermally conductive atmosphere comprising oxygen. As the lamps are operated, the oxygen reacts with carbon containing species. Consumed oxygen is replaced over time until the thermal conductivity of the atmosphere falls below a tolerance threshold. The atmosphere is then evacuated and replaced.
Claims20
A method of operating a process lamp, comprising:
- immersing the lamp in an operating atmosphere having between about 1% and about 25% of an oxidizing gas;
- and
- oxidizing hydrocarbons in the thermally conductive atmosphere.
A method of operating a lamp, comprising:
- establishing a thermally conductive atmosphere comprising oxygen in a chamber surrounding the lamp at a first pressure of about 15 Torr or less;
- leaking air into the chamber until the chamber pressure reaches at least about 5 Torr above the first pressure while operating the lamp;
- and
- evacuating the chamber to a pressure less than about 1 Torr.
1 more element
A lamp assembly for a thermal processing chamber, the lamp assembly comprising:
- a plurality of recesses for housing a plurality of lamps;
- a source of thermally conductive gas coupled to the plurality of recesses;
- and
- a source of oxidizing gas coupled to the plurality of recesses.
1 more element
Dependencies are inferred from the claim text.