In Situ Formation and Deposition of Palladium Pd(0) in Reactors
AssigneeCorning Incorporated
InventorsClemens Rudolf Horn, Carine Cerato-Noyerie
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Abstract
The invention relates mainly to a process for the in situ generation of a catalyst (Pd(0)) and the deposition of said catalyst on the internal wall(s) of a glass, glass-ceramic or ceramic reactor. The invention further relates to a reactor, preferably a microfluidic device, as may be obtained by the in situ generation and deposition of palladium Pd(0) on its internal wall(s) carried out according to said process. The invention also globally concerns catalytic processes including said process.
Claims16
A process for the in situ generation of a catalyst and the deposition of said catalyst on the internal wall(s) of a glass, glass-ceramic or ceramic reactor, comprising:
- a) contacting said internal wall(s) of said reactor with an inorganic base solution;
- b) contacting the thus pretreated internal wall(s) with a solution containing a precursor of palladium Pd(0) while subjecting said solution to a reduction reaction, in order to deposit the Pd(0) formed in situ onto the pretreated internal wall(s).
Dependencies are inferred from the claim text.