Solid-state imaging device and method for manufacturing the same

A solid-state imaging device, comprising:

• a light receiving portion formed on a semiconductor substrate;
• a multilayer structure that is formed on the semiconductor substrate, the multilayer structure including a plurality of insulating films, and the multilayer structure including a first concave portion at a position corresponding to the light receiving portion;
• and
• an optical waveguide that is formed in the first concave portion to guide light to the light receiving portion, wherein
• the optical waveguide includes a first film and a second film that are formed sequentially from the multilayer structure,
• the first film and the second film are each higher than the interlayer insulating film in a refractive index,
• the first film covers a side face and a bottom face of the first concave portion and includes a second concave portion at a position corresponding to the first concave portion,
• the second film is formed such that an inside of the second concave portion is filled with the second film, and
• a thickness of a portion of the first film that is formed on the side face of the first concave portion is thinner at a top portion of the first concave portion than at a bottom portion of the first concave portion.