Systems and method for optimization of laser beam spatial intensity profile
AssigneeTcz LLC
InventorsBrandon A. Turk, David S. Knowles
Life of this patent
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AssigneeTcz LLC
InventorsBrandon A. Turk, David S. Knowles
Estimating the term…
A thin beam directional crystallization system configured to process a substrate comprises a laser configured to produce laser light, the laser configured to have a high energy mode and a low energy mode. The high energy mode is configured to produce light energy sufficient to completely melt a substrate coated with amorphous silicon film, while the low energy mode is configured to produce light energy that is not sufficient to completely melt a substrate coated with amorphous silicon film. The system further comprises beam shaping optics configured to convert the laser light emitted from the laser into a long thin beam with a short axis and a long axis, a stage configured to support the substrate and film, and a translator coupled with the stage, the translator configured to advance the substrate and film so as to produce a step size in conjunction with the firing of the laser.
A device for processing substrates comprising:
An apparatus comprising:
A computer-readable medium containing instructions which, when executed by a computer, perform a process comprising:
Dependencies are inferred from the claim text.