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US 2012/0260222 A1Published application
Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
AssigneeHoya Corporation
InventorsHiroyuki ISHIDA, Tamiya AIYAMA, Koichi MARUYAMA
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Abstract
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
Claims16
A transfer mask manufacturing method comprising:
- preparing a mask blank comprising a substrate and a film formed on a surface of the substrate;
- determining, based on mask blank information, a region where a mask pattern is to be arranged on the mask blank,
- the mask blank information including substrate information which is acquired before the film is formed and which includes state information representative of a state of the substrate, and film information which is acquired after the film is formed and which includes state information representative of a state of the film;
- the substrate information including at least one of surface information of the substrate, surface form information of the substrate, and optical property information of the substrate,
- the film information including at least one of surface information of the film, surface form information of the film, and optical property information of the film;
- and
- patterning the mask blank with reference to the determined region to form the mask pattern.
4 more elements
Dependencies are inferred from the claim text.