US 2012/0258652 A1 · ROTARY BUFFING PAD

Abstract

Provided is a flat-faced buffing pad that includes a plurality of apertures of variable size. The apertures are generally larger in the areas toward the center of the pad, while being generally smaller in the areas toward the periphery of the pad. Some embodiments further include apertures disposed along one or more concentric circular rings located along the front surface and generally symmetrical about the rotation axis. These configurations of apertures provide both superior cut performance and superior finish. Moreover, these configurations minimize several undesirable aspects in a polishing operation, such as slinging of the polishing compound, vibration, wobbling, and drag felt by the operator as the rotary pad slides across the surface to be polished.

Claims22

Dependent claims

A rotary buffing pad comprising:

a substrate comprising an open-celled polymeric foam that has a compression deflection value when compressed to 25 percent of original volume ranging from 2000 to 7000 Pascals and having a front surface, back surface, and a rotation axis perpendicular to the front and back surfaces, the substrate further comprising:
an inner region adjacent to and surrounding the rotation axis;
an outer region surrounding the inner region;
a plurality of first apertures having a first average size located within the inner region and extending from the front surface toward the back surface;
and
a plurality of second apertures having a second average size located within the outer region and extending from the front surface toward the back surface, wherein the first average size is larger than the second average size.

3 more elements

Dependencies are inferred from the claim text.

Rotary buffing pad

Life of this patent

Rotary buffing pad

Life of this patent

Abstract

Claims22