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US 2012/0258649 A1Published application
Method of Making and Apparatus Having Windowless Polishing Pad and Protected Fiber
AssigneeApplied Materials, Inc.
InventorsJimin Zhang, Alain Duboust, Doyle E. Bennett
Life of this patent
Estimating the term…
Abstract
A polishing system includes a polishing pad with an aperture that extends through all layers of the polishing pad and a light transmissive film positioned on top of a light-generating or light-guiding element of an optical monitoring system.
Claims12
1-21. (canceled)
An optical monitoring system for a chemical mechanical polishing system, comprising:
- a light-source;
- a light-guiding element having a first end coupled to the light source and a second end to direct light onto a substrate in the chemical mechanical polishing system;
- and
- a detector positioned to receive reflections of the light directed onto the substrate;
- a light-transmissive film positioned on the light -guiding element to protect the light-generating or light-guiding element from leakage of liquid without contacting a side of an aperture in a platen or polishing pad of the chemical mechanical polishing system.
2 more elements
Dependencies are inferred from the claim text.