Apparatus and method for preparing relief printing form
AssigneeE. I. Du Pont de Nemours and Company
InventorsMICHAEL LEE RUDOLPH, JOSEPH ANTHONY PERROTTO, DHIREN V. PATEL, ROBERT A. MCMILLEN
Life of this patent
Estimating the term…
Loading patent…
AssigneeE. I. Du Pont de Nemours and Company
InventorsMICHAEL LEE RUDOLPH, JOSEPH ANTHONY PERROTTO, DHIREN V. PATEL, ROBERT A. MCMILLEN
Estimating the term…
The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
A method for preparing a relief printing form from a photosensitive element, comprising the steps of:
Dependencies are inferred from the claim text.