Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji ICHIKAWA, Takahiro YASUE, Satoshi YAMAGUCHI
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Abstract
A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
Claims6
A resist composition comprising
- (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid,
- (B) an acid generator having an acid-labile group;
- and
- (D) a compound represented by the formula (I),
- wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom;
- m and n independently represent an integer of 0 to 4.
Dependencies are inferred from the claim text.