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US 2012/0258403 A1Published application
Salt and photoresist composition comprising the same
AssigneeSumitomo Chemical Company, Limited
InventorsYukako ANRYU, Koji ICHIKAWA
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Abstract
The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L′ represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5): and Z+ represents an organic counter ion.
Claims10
A salt represented by the formula (I):
- wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5):
- and Z+ represents an organic counter ion.
Dependencies are inferred from the claim text.