Exposure method and exposure device

An exposure device for forming, while conveying, in a first direction, a substrate having a light blocking layer formed in a grid-like shape, colored pixels of a color filter on the substrate, the exposure device comprising:

• a blinking light source that repeatedly emits light and emits no light;
• a photomask having a plurality of openings;
• a substrate conveyor unit for continuously conveying, in the first direction, the substrate having a resist applied thereto;
• an image recognition unit for detecting a relative positional relationship between the photomask and the substrate, based on images of the photomask and the substrate having been taken;
• an alignment section for moving the photomask in a second direction orthogonal to the first direction, based on the positional relationship detected by the image recognition unit, to perform alignment between the photomask and the substrate, in each exposure, and
• a blinking interval adjustment section for adjusting, in each exposure, intervals at which the blinking light source blinks such that a portion of the plurality of openings of the photomask overlaps a portion of exposed patterns having been obtained through the plurality of openings by an immediately preceding exposure, wherein
• a difference between a width of each opening of the photomask in the first direction, and a width, in the first direction, of one opening region surrounded by the light blocking layer is greater than a difference between a width of each opening of the photomask in the second direction, and a width, in the second direction, of one opening region surrounded by the light blocking layer.