Methods and apparatuses for roll-on coating.
AssigneeDynamic Micro Systems, Semiconductor Equipment GmbH
InventorsLutz Rebstock, Klaus Conrad Wolke
Life of this patent
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Abstract
Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.
Claims20
A method for depositing a coating layer on a substrate, comprising:
- flowing a fluid to an end of one or more fluid-supplied rollers, wherein the fluid is transferred to a portion of the outer surface of the rollers;
- contacting the rollers to the substrate surface;
- and
- rotating the rollers to produce the coating layer on the substrate surface.
A method for depositing a dopant layer on a substrate, comprising:
- flowing a chemical comprising a dopant to an end of one or more fluid-supplied rollers, wherein the fluid is transferred to a portion of the outer surface of the rollers;
- introducing the substrate to the fluid-supplied rollers;
- contacting the rollers to the substrate surface;
- and
- rotating the rollers to produce a dopant layer on the substrate surface.
A method for depositing a coating layer on a substrate, comprising:
- flowing an emulgated fluid to an end of one or more fluid-supplied rollers, wherein the fluid is transferred to a portion of the outer surface of the rollers;
- heating the substrate;
- contacting the rollers to a substrate surface;
- and
- rotating the rollers to produce a coating on the substrate surface.
Dependencies are inferred from the claim text.