Apparatus and method for uv treatment, chemical treatment, and deposition

A processing system, comprising:

• a transfer chamber defining a transfer volume;
• a substrate transfer robot disposed in the transfer volume;
• and
• a twin volume processing chamber coupled to the transfer chamber, wherein the twin volume processing chamber comprises:
• a chamber body defining a first inner volume and a second inner volume;
• a first substrate support disposed in the first inner volume;
• a first UV transparent gas distribution showerhead disposed above the first substrate support;
• a first UV transparent window disposed above the first UV transparent gas distribution showerhead, wherein a first gas volume is formed between the first UV transparent gas distribution showerhead and the first UV transparent window, and the first gas volume and the first inner volume are in fluid communication through the first UV transparent gas distribution showerhead;
• a first UV unit disposed outside the first UV transparent window, wherein the first UV unit is configured to direct UV lights towards the first substrate support through the first UV transparent window and the first UV transparent gas distribution showerhead;
• a second substrate support disposed in the second inner volume;
• a second UV transparent gas distribution showerhead disposed above the second substrate support;
• a second UV transparent window disposed above the second UV transparent gas distribution showerhead, wherein a second gas volume is formed between the second UV transparent gas distribution showerhead and the second UV transparent window, and the second gas volume and the second inner volume are in fluid communication through the second UV transparent gas distribution showerhead;
• and
• a second UV unit disposed outside the second UV transparent window, wherein the second UV unit is configured to direct UV lights towards the second substrate support through the second UV transparent window and the second UV transparent gas distribution showerhead.

A method for processing a substrate, comprising:

• receiving a substrate on a substrate support disposed in an inner volume of a processing chamber, wherein the processing chamber comprises:
• a UV transparent gas distribution showerhead disposed above the substrate support;
• a UV transparent window disposed above the UV transparent gas distribution showerhead;
• and
• a UV unit disposed outside the inner volume, wherein the UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead;
• chemically treating the substrate by flowing one or more processing gas through the UV transparent gas distribution showerhead from a gas volume defined between the UV transparent window and the UV transparent gas distribution showerhead;
• and
• curing the substrate by directing a UV energy towards the substrate from the UV unit through the UV transparent gas distribution showerhead and the UV transparent window.