Apparatus and method for coating substrate
AssigneeBeneq Oy
InventorKai Asikkala
Life of this patent
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Abstract
An apparatus and a method for producing a liquid film from one or more liquid precursors onto the surface of a substrate in order to establish a coating, the apparatus being arranged to direct an aerosol flow against the surface of the substrate in a coating chamber. The apparatus includes a homogenizing nozzle for making the aerosol flow homogeneous substantially in the direction of the surface of the substrate prior to passing the flow into the coating chamber.
Claims23
1-22. (canceled)
An apparatus for producing a liquid film from one or more liquid precursors onto the surface of a substrate in order to establish a coating, said apparatus being arranged to direct an aerosol flow against the surface of the substrate in a coating chamber, wherein the apparatus comprises a homogenizing nozzle for making the aerosol flow homogeneous substantially in the direction of the surface of the substrate prior to passing the flow into the coating chamber.
A method for producing a liquid film from one or more liquid precursors onto the surface of a substrate in order to apply a coating, the method comprising the steps of:
- atomizing one or more liquid precursors into droplets for generating an aerosol flow;
- passing the thus generated aerosol flow to a coating chamber;
- and
- guiding the aerosol flow in the coating chamber onto the surface of the substrate in order to produce a liquid film,
- wherein in the method:
- the aerosol flow is homogenized substantially in direction of the substrate surface prior to passing the flow to the coating chamber.
A method for applying a coating, the method comprising:
- passing an aerosol flow in a homogeneous fashion into a coating chamber by using an elongated and tapering homogenizing nozzle, wherein the aerosol flow directed to the surface of a substrate in order to apply a liquid film for producing a coating.
Dependencies are inferred from the claim text.