Method and apparatus for producing a fresnel zone plate
AssigneeMax-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
InventorsGisela Schuetz, Corrine Grévent, Marcel Mayer, Brigitte Baretzky
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Abstract
A method of producing a Fresnel zone plate (15) comprising: making available a substrate (1, 4, 7) which is rotationally symmetrical with respect to its centre axis (1a, 4a, 7a); applying layers (2a-d; 5a-d; 8a-d; 11) following in succession by means of an atomic layer deposition (ALD) method to faces (1b-c; 4b-c; 7b-c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate, and severing (3a, b; 6a, b; 9a, b) at least one slice (13) from the coated substrate (1, 4, 7), by the coated substrate (1, 4, 7) being divided at least once at a right angle to the centre axis (1a, 4a, 7a).
Claims14
A method of producing a Fresnel zone plate (15), virtually without limitation of an aspect ratio, comprising:
- making available a substrate (1, 4, 7) which is rotationally symmetrical with respect to its centre axis (1a, 4a, 7a);
- applying layers (2a-d;
- 5a-d;
- 8a-d;
- 11) following in succession by means of an atomic layer deposition (ALD) method to faces (1b-c;
- 4b-c;
- 7b-c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate, and
- severing (3a, b;
- 6a, b;
- 9a, b) at least one slice (13) from the coated substrate (1, 4, 7), by the coated substrate (1, 4, 7) being divided at least once at a right angle to the centre axis (1a, 4a, 7a).
Dependencies are inferred from the claim text.