Evaporation system with measurement unit
AssigneeApplied Materials, Inc.
InventorUwe HOFFMANN
Life of this patent
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Abstract
An evaporator for evaporating a material onto a substrate is described. The evaporator includes a guiding means for guiding the material towards at least one opening nozzle. The guiding means includes a measurement outlet for a portion of the material. The evaporator further includes a first measurement system configured for generating a first signal correlated with a deposition rate of the evaporator and having a first detector positioned for being coated by the material and a second optical measurement system for generating a second signal correlated with the deposition rate of the evaporator and wherein the second signal is based on the portion of the material of the measurement outlet.
Claims20
An evaporator for evaporating a material onto a substrate, comprising:
- a guiding means for guiding the material towards at least one opening nozzle, the guiding means comprises
- a measurement outlet for a portion of the material, particularly with an evaporation direction different from the evaporation direction of the at least one opening nozzle;
- the evaporator further comprising:
- a first measurement system configured for generating a first signal correlated with a deposition rate of the evaporator and having a first detector positioned for being coated by the material;
- and
- a second measurement system for generating a second signal correlated with the deposition rate of the evaporator and wherein the second signal is based on the portion of the material of the measurement outlet.
An evaporation apparatus for depositing material on a substrate, comprising:
- a chamber for depositing the material on the substrate;
- and
- an evaporator for evaporating the material onto the substrate, wherein the evaporator is provided within the chamber, the evaporator comprises:
- a guiding means for guiding the material towards at least one opening nozzle, the guiding means comprises
- a measurement outlet for a portion of the material, particularly with an evaporation direction different from the evaporation direction of the at least one opening nozzle;
- the evaporator further comprising:
- a first measurement system configured for generating a first signal correlated with a deposition rate of the evaporator and having a first detector positioned for being coated by the material;
- and
- a second optical measurement system for generating a second signal correlated with the deposition rate of the evaporator and wherein the second signal is based on the portion of the material of the measurement outlet.
An method of operating an evaporation apparatus for evaporating a material, comprising:
- guiding a first portion of evaporated material onto a substrate via opening nozzles;
- guiding a second portion of evaporated material onto a first detector via a measurement outlet;
- providing a second detector with respect to the second portion of the evaporated material such that a signal corresponding to a deposition rate of evaporated material can be generated, wherein the providing the second detector comprises in particular:
- moving a test substrate portion between the measurement outlet and the first detector to deposit the test substrate portion with the second portion of evaporated material;
- removing the test substrate portion from between the measurement outlet and the first detector to again guide the second portion of evaporated material onto the first detector via the measurement outlet;
- and
- measuring a signal corresponding with a layer thickness of the layer of evaporated material deposited on the test substrate portion with an optical measurement system;
- the method further comprises:
- using the signal for calibration of the first detector.
Dependencies are inferred from the claim text.