Method for determining recording exposure for holographic recording medium and method for recording thereon
AssigneeTDK Corporation
InventorsJiro YOSHINARI, Naoki HAYASHIDA, Shohei FUJII, Kazushi TANAKA
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AssigneeTDK Corporation
InventorsJiro YOSHINARI, Naoki HAYASHIDA, Shohei FUJII, Kazushi TANAKA
Estimating the term…
An optimal recording exposure is determined by varying in the first to nth stages the recording exposure with a write laser beam to record a bright pattern image and a dark pattern image in each stage as the first to nth bright pattern images and the first to nth dark pattern images, respectively; irradiating the respective pattern images with a read beam to detect the intensity of a diffracted beam from the central portion of each image of the bright and dark patterns; calculating Sa1/Sb1=SNR1, . . . , and San/Sbn=SNRn, where Sa1 to San are the intensity of a diffracted beam from the first to nth bright pattern images and Sb1 to Sbn are the intensity of s diffracted beam from the first to nth dark pattern images; and determining a recording exposure which is given at the SNRmax being the maximum value of the resulting SNR1 to SNRn.
A method for determining a recording exposure to record a plurality of elemental holograms when forming the elemental holograms on a holographic recording medium to create a three-dimensional image, the method comprising:
Dependencies are inferred from the claim text.