Nanopillar Decoupling Capacitor
AssigneeInternational Business Machines Corporation
InventorsSatya N. Chakravarti, Dechao Guo, Huiming Bu, Keith Kwong Hon Wong
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Abstract
Techniques for incorporating nanotechnology into decoupling capacitor designs are provided. In one aspect, a decoupling capacitor is provided. The decoupling capacitor comprises a first electrode; an intermediate layer adjacent to the first electrode having a plurality of nanochannels therein; a conformal dielectric layer formed over the intermediate layer and lining the nanochannels; and a second electrode at least a portion of which is formed from an array of nanopillars that fill the nanochannels in the intermediate layer. Methods for fabricating the decoupling capacitor are also provided, as are semiconductor devices incorporating the decoupling capacitor design.
Claims19
A decoupling capacitor, comprising:
- a first electrode;
- an intermediate layer adjacent to the first electrode having a plurality of nanochannels therein;
- a conformal dielectric layer formed over the intermediate layer and lining the nanochannels;
- and
- a second electrode at least a portion of which is formed from an array of nanopillars that fill the nanochannels in the intermediate layer.
A method for fabricating a decoupling capacitor, comprising the steps of:
- forming a first electrode;
- forming an intermediate layer adjacent to the first electrode having a plurality of nanochannels therein;
- depositing a conformal dielectric layer over the intermediate layer and lining the nanochannels;
- and
- forming a second electrode at least a portion of which comprises an array of nanopillars that fill the nanochannels in the intermediate layer.
A semiconductor device, comprising:
- a substrate;
- a circuit layer adjacent to the substrate;
- a decoupling capacitor adjacent to at least a portion of the circuit layer, the decoupling capacitor comprising:
- a first electrode adjacent to the circuit layer;
- an intermediate layer adjacent to the first electrode having a plurality of nanochannels therein;
- a conformal dielectric layer formed over the intermediate layer and lining the nanochannels;
- and
- a second electrode at least a portion of which is formed from an array of nanopillars that fill the nanochannels in the intermediate layer.
Dependencies are inferred from the claim text.