Profile measuring apparatus, method for measuring profile, and method for manufacturing structure
OwnerTomoaki YAMADA, Takashi Tanemurainventors
Life of this patent
Estimating the term…
Loading patent…
OwnerTomoaki YAMADA, Takashi Tanemurainventors
Estimating the term…
A profile measuring apparatus includes: an irradiating unit which is configured to irradiate the measuring object with light from the light source to form a spotted pattern; a scanner which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.
A profile measuring apparatus which measures a profile of a measuring object, comprising:
A method for measuring a profile of a measuring object, comprising:
Dependencies are inferred from the claim text.