Method and system for removal of contaminates from phaseshift photomasks
AssigneeMicron Technology, Inc.
InventorsShad Hedges, James Baugh
Life of this patent
Estimating the term…
Abstract
A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
Claims22
1-55. (canceled)
A photomask cleaning cover, comprising:
- at least one panel, wherein the panel includes a distal surface defining a recessed area of sufficient size to isolate a photomask region on a reticle from a pellicle frame located on the reticle;
- a seal extending along the circumference of the distal surface.
57-59. (canceled)
A reticle cleaning cover comprising:
- a top portion;
- and
- a sidewall extending from the top portion, wherein the sidewall defines an enclosure with the top portion corresponding to a photomask area of a reticle to cover the photomask area.
A cover used in cleaning a reticle having a photomask area and a pellicle frame positioned around the photomask area, the cover comprising:
- a top panel;
- and
- a wall extending from the top panel, wherein the wall is positionable proximate to the photomask area to form a fluid barrier around the photomask area.
A photomask cover used in cleaning a reticle having a photomask area and a pellicle frame positioned around the photomask area, the cover comprising:
- an inflatable bladder positionable over the photomask area, wherein the bladder is configured to expand laterally to engage the pellicle frame to form a seal isolating the photomask.
Dependencies are inferred from the claim text.