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US 2012/0237696 A1Published application
Fluid distribution members and/or assemblies
AssigneeAxcelis Technologies, Inc.
InventorsARMIN HUSEINOVIC, IVAN L. BERRY
Life of this patent
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Abstract
A fluid distribution member assembly for use in a substrate processing system includes a fluid distribution member having a central portion and a perimeter portion. The fluid distribution member defines at least one slot formed there-through and the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion.
Claims31
A fluid distribution member assembly for use in a substrate processing system, comprising:
- a fluid distribution member having a central portion and a perimeter portion, wherein the fluid distribution member defines at least one slot formed there-through, and wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion.
A substrate processing apparatus, comprising:
- a process chamber in which a work-piece can be treated with plasma, gas, or liquid;
- and
- at least one fluid distribution member disposed within the process chamber and configured to distribute the plasma, gas, or liquid to the work-piece, wherein the at least one fluid distribution member comprises a central portion and a perimeter portion, wherein the at least one fluid distribution member defines at least one slot formed there-through, and wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion.
A method for plasma processing a substrate, the method comprising
- generating a reduced ion density plasma in a plasma generator;
- directing the reduced ion density plasma through a fluid distribution member, the fluid distribution member comprising a central portion and a perimeter portion, said fluid distribution member defining at least one slot formed there-through, wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion;
- and
- exposing a work-piece to the reduced ion density plasma.
1 more element
Dependencies are inferred from the claim text.