Patterning of ultra-low refractive index high surface area nanoparticulate films
AssigneeThe Curators of the University of Missouri
InventorsVenumadhav Korampally, Shubhra Gangopadhyay, Keshab Gangopadhyay
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Abstract
A method for forming a nanoporous film pattern on a substrate comprising imparting differential surface energy to a surface of a substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern; and curing the nanoporous film precursor to form the nanoporous film pattern.
Claims18
A method for forming a nanoporous film pattern on a substrate comprising:
- imparting differential surface energy to a surface of a substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate;
- depositing a nanoporous film precursor onto the differential surface energy pattern;
- and
- curing the nanoporous film precursor to form the nanoporous film pattern.
Dependencies are inferred from the claim text.