US 2012/0236410 A1 · WIRE-GRID POLARIZER AND PROCESS FOR PRODUCING THE SAME

Abstract

A wire-grid polarizer comprising a light-transmitting substrate 14 having a surface on which a plurality of ridges 12 are formed in parallel with one another at a predetermined pitch with flat portions 13 formed between the ridges 12, each of the ridges 12 having a width narrowing from the bottom toward the top; and a metal layer 20 covering at least one side surface of each ridge 12, the maximum covering thickness of the metal layer on a lower half of the ridge being smaller than the maximum covering thickness of the metal layer on an upper half of the ridge; and a process for producing the first metal layer 20 by vapor-depositing a metal from a direction satisfying tan(θR1±10)=(Pp−Dpb/2)/Hp on the first side surface 16 side, and subsequently vapor-depositing the metal from a direction at an angle satisfying θR1+5≦θR2≦θR1+25.

Claims12

Dependent claims

A wire-grid polarizer comprising:

a light-transmitting substrate having a surface on which a plurality of ridges are formed in parallel with one another at a predetermined pitch with flat portions formed between the ridges, each of the ridges having a width narrowing from the bottom portion toward the top portion;
and
a metal layer comprising a metal or a metal compound and covering at least one side surface of each ridge extending along the longitudinal direction of the ridge, the maximum value of the covering thickness of the metal layer in a region from a half-height position to the bottom portion of the ridge being smaller than the maximum value of the covering thickness of the metal layer in a region from the half-height position to the top portion of the ridge.

A process for producing a wire-grid polarizer comprising a light-transmitting substrate having a surface on which a plurality of ridges are formed in parallel with one another at a predetermined pitch with flat portions formed between the ridges, each of the ridges having a width narrowing from the bottom portion toward the top portion;

and a metal layer comprising a metal or a metal compound and covering at least one side surface of each ridge extending along the longitudinal direction of the ridge;
the process comprising a step (1R1) of carrying out vapor deposition of a metal or a metal compound from a direction substantially perpendicular to the longitudinal direction of each ridge and at an angle θR1 (°) satisfying the following formula (a) on a first side surface side to the height direction of the ridge;
and
a step (1R2) after the step (1R1), of carrying out vapor deposition of the metal or the metal compound from a direction substantially perpendicular to the longitudinal direction of each ridge and at an angle θR2 (°) satisfying the following formula (b) on the first side surface side to the height direction of the ridge under a condition so that the vapor deposition amount becomes larger than that of the step (1R1), to form the metal layer:
tan(θR1±10)=(Pp−Dpb/2)/Hp (a)
θR1+3≦θR2≦θR1+30 (b)
where Pp is the pitch of the ridges, Dpb is the width of the bottom portion of each ridge, and Hp is the height of each ridge in formula (a).

4 more elements

Dependencies are inferred from the claim text.

Wire-grid polarizer and process for producing the same

Life of this patent

Wire-grid polarizer and process for producing the same

Life of this patent

Abstract

Claims12